How to control the microstructure of thin films during the deposition process using HIPiMS technology

HIPiMS technology can effectively regulate the microstructure of thin films during the deposition process by controlling a series of process parameters. These parameters include but are not limited to power, pulse frequency, gas pressure, substrate temperature, etc. The following is a detailed explanation:

Can HiPIMS power supply deposit oxides

HiPIMS (High Power Impulse Magnetron Sputtering) is a thin film deposition technique that utilizes high-density plasma generated by a high-frequency pulse power source for material sputtering deposition.

Difference between vacuum coating and electroplating

Vacuum coating and electroplating, as two common surface treatment technologies, differ significantly in a number of ways. The following is a detailed description of the differences between the two:

Vacuum deposition process flow

Vacuum deposition is a common surface treatment process, which is often used to manufacture optical lenses, solar panels, LED and other products. The main process includes the following steps:

DLC coating - \"plain clothes\" for automobile wiper

Wiper is an important device of automobile, which plays a vital role in safe driving.

A good wiper must have the characteristics of heat resistance, cold resistance, acid and alkali resistance, corrosion resistance, can fit the windshield, reduce the burden of the motor,

Study on plasma permeability of porous ceramic materials

Zinc oxide (ZnO), as a high band gap semiconductor, has been widely used in gas sensing and catalysis fields due to its excellent chemical stability and biocompatibility, especially t-ZnO with three-dimensional porous skeleton structure. 

Comparison of TiAlN thin films prepared by HiPIMS and dcMS on the inner surface of micropores

A diamond-like coating was prepared on the inner wall of the pipeline using an anode ion source